Economy

India Embarks on Silicon Carbide Semiconductor Production

November 4, 2025 3 min read

Why in news?

Odisha’s chief minister recently laid the foundation stone for the country’s first end‑to‑end silicon carbide (SiC) semiconductor fabrication plant. The facility, being set up by SiCSem Private Limited in partnership with a British firm, is part of India’s semiconductor mission and aims to position the nation as a leader in power electronics.

Background

Silicon carbide is a compound of silicon and carbon that occurs in nature as the rare mineral moissanite. When manufactured, SiC is extremely hard – ranking about 9–9.5 on the Mohs scale – and has a high melting point. Its crystals possess a wide bandgap, high thermal conductivity and strong electric field breakdown strength. These properties allow SiC devices to operate at higher temperatures, voltages and frequencies than conventional silicon chips. Because it also has a low thermal expansion coefficient and resists chemical attack, SiC is used as an abrasive, in ceramic armour, and increasingly in high‑power semiconductor devices for electric vehicles, renewable energy systems, railways and aerospace.

Details of the project

Significance

Conclusion

The launch of India’s first silicon carbide fabrication plant marks a milestone for the nation’s semiconductor ambitions. By leveraging SiC’s superior properties, the facility promises to supply critical components for energy‑efficient technologies and spur innovation across multiple sectors.

Sources: The Indian Express, Wikipedia

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